

Photo resist is a key material that has major impact on the picture quality and performance of LCD and OLED. It is a liquid chemical that reacts to light to form fine and small patterns and it is a product that integrates advanced technologies including semiconductor process technologies, photo-etching technology materials engineering, and fine chemistry. Since successfully mass-producing photo resist materials for the first time in Korea with proprietary technologies, LG Chem has been leading global technologies with high quality products through its unrivaled synthesis/composition/inspection technologies.
[Bank/PDL] Acts as insulating film between OLED anode electrodes and cathode electrodes
[Black CS] Combines Black Matrix and Column Spacer
[Black Matrix] Prevents penetration of the liquid crystal array part that activates abnormally in the TFT
[Over coat] Compensates R/G/B pattern alignment and functions as a protective film
[Column Spacer] Maintains uniformity of gaps between upper and lower glass substrates of LCD

