Stripper
Essential Process Material for Fine Pattern Formation in Advanced Display and Semiconductor Processes
Stripper is a material used to remove photoresist (PR) and various organic residues remaining after pattern formation in display and semiconductor manufacturing processes.
It secures surface cleanliness after processing and minimizes damage to fine patterns, contributing to the stability of subsequent processes and the reliability of final products.
As the display and semiconductor industries continue to advance toward finer dimensions and higher integration, the importance of process residue control and productivity improvement is increasing.
LG Chem provides Stripper products with excellent stripping performance and fast stripping speed, meeting the requirements of advanced manufacturing processes through DMSO- and NMP-free design technology and customized solutions.
Features
Excellent Stripping Performance
Short Stripping Time
Prevention of Substrate and Thin-Film Damage
DMSO & NMP-Free Design
Applications
Functions and Structure
• Complete PR removal within a short period through advanced residue removal technology
• Minimization of metal and substrate damage through proprietary interface control technology
• Process simplification and productivity improvement through the development of integrated Posi/Nega strippers
• Formulation designed without the use of NMP and DMSO
