Stripper

Stripper
Stripper LG Chem Advanced Materials Essential Process Material for Fine Pattern Formation in Advanced Display and Semiconductor Processes
Stripper LG Chem Advanced Materials Essential Process Material for Fine Pattern Formation in Advanced Display and Semiconductor Processes

Essential Process Material for Fine Pattern Formation in Advanced Display and Semiconductor Processes

Stripper is a material used to remove photoresist (PR) and various organic residues remaining after pattern formation in display and semiconductor manufacturing processes.
It secures surface cleanliness after processing and minimizes damage to fine patterns, contributing to the stability of subsequent processes and the reliability of final products.
As the display and semiconductor industries continue to advance toward finer dimensions and higher integration, the importance of process residue control and productivity improvement is increasing.
LG Chem provides Stripper products with excellent stripping performance and fast stripping speed, meeting the requirements of advanced manufacturing processes through DMSO- and NMP-free design technology and customized solutions.

Features

Excellent Stripping Performance

Short Stripping Time

Prevention of Substrate and Thin-Film Damage

DMSO & NMP-Free Design

Applications

Functions and Structure

• Complete PR removal within a short period through advanced residue removal technology
• Minimization of metal and substrate damage through proprietary interface control technology
• Process simplification and productivity improvement through the development of integrated Posi/Nega strippers
• Formulation designed without the use of NMP and DMSO

Product Group

    Advanced Adhesive Products and Their Functions

      FAQ

      • Stripper is a material used to remove photoresist (PR) and organic residues generated during display and semiconductor manufacturing processes. It secures surface cleanliness and contributes to the stability of subsequent processes and improved product reliability.
      • If residual resist and residue materials remaining after the pattern formation process are not removed, process failures, pattern defects, and reliability degradation may occur. Stripper supports stable manufacturing processes by removing these contaminants.
      • Stripping speed is directly related to productivity. Fast stripping performance reduces process time, improves equipment productivity, and contributes to enhanced manufacturing efficiency.
      • In display manufacturing processes such as OLED and LCD, Stripper removes photoresist remaining after pattern formation, securing substrate surface cleanliness and improving the quality of subsequent processes.
      • High-resolution OLEDs require extremely fine pattern precision. If residue removal performance is insufficient, pixel defects or pattern defects may occur. Therefore, excellent stripping performance and low-damage characteristics are important.
      • In semiconductor manufacturing processes, Stripper removes photoresist and process residues, protecting fine patterns and contributing to improved yield and reliability in subsequent processes.
      • It is used to remove residual negative and positive photoresists and residues after lithography-based processes such as RDL (Redistribution Layer), Bump, and TSV.
      • It must provide excellent residue removal performance even in ultra-fine pattern structures, while requiring low-damage characteristics that minimize damage to metal interconnects and low-k materials.
      • Based on Low Damage Chemistry and Advanced Residue Removal technologies, LG Chem provides excellent stripping speed and residue removal performance while minimizing damage to metals and substrates.
      • By applying a DMSO- and NMP-free design, it supports compliance with global environmental regulations while providing stable stripping performance.

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